Atomic Layer Deposition Bid Number: 50012-505-22 Date Issued: 10/06/2021 Bid Open Date/Time: 10/28/2021 2:00:00 PM CT Original: https://wwwcfprd.doa.louisiana.gov/osp/lapac/agency/pdf/7723900.pdf
The Army Research Lab (ARL) requires the procurement of one (1) Atomic Layer Deposition (ALD) System. Please contact Contracting Officer, Salma Khairedin, Salma.m.khairedin.civ@mail.mil with a request to access Salient Characteristics document for full requirement.
Solicitation Reference #: 23-0022Title: ATOMIC LAYER DEPOSITION SYSTEM(UW-MAD)[23-0022]Available Date: 10/14/2022Due Date: 10/28/2022 2:00:00 PMAre faxed Bids acceptable?NoAre e-mailed bids acceptable? NoBid Synopsis: The University of Wisconsin-Madison is requesting bids for the purchase of ATOMIC LAYER DEPOSITION SYSTEM. Attached is the Request for Bid (RFB) package.
Broad precursor coverage, flexible process adjustment (temperature, pressure, power etc.), accurate precursor dose control, good coating uniformity, substrate plasma treatment and ALD precursor usage monitoring are the requirements for the new ALD system. General DescriptionAs described above, this ALD system is a unique thin film deposition tool, which only deposit one atomic layer at one time.
Synopsis:NASA/NSSC has a requirement for Large Atomic Layer Deposition Chamber.This a Brand Name or Equal To requirement.NASA/NSSC will be the procuring center for this effort.
Notice of Intent for an Atomic Layer Deposition System
The Naval Research Laboratory (NRL) has a requirement for the delivery, installation and training of a commercially available Atomic Layer Deposition (ALD) reactor with multiple precursor delivery ports, integrated in-situ Ellipsometer, and single wafer transfer system; as described in the Specifications Attachment, of this announcement.
