Search results for: mask aligner with align

The Detector Systems Branch of GSFC has a requirement to acquire a contact mask-aligner system with align-for-bond capabilities, for use in the Detector Development Lab (DDL). The system has two main functions, 1) is to align a mask to a substrate (typically a wafer) and 2) is to expose UV light onto the substrate through the mask.

The Detector Systems Branch of GSFC has a requirement to acquire a contact mask-aligner system with align-for-bond capabilities, for use in the Detector Development Lab (DDL). The system has two main functions, 1) is to align a mask to a substrate (typically a wafer) and 2) to expose UV light onto the substrate through the mask.