Request for Information III-V Semiconductor Reactive Ion Beam Etch Reactor (RIBE) with Single Wafer Semi-Automatic Transfer Chamber.

Brookhaven Science Associates (BSA) supports the Nanoscale Science Research Center Recapitalization project (NSRC-Recap) which is adding new and updated capabilities to the Department of Energy’s nanoscience infrastructure. As part of this work, BSA is potentially seeking to acquire a Load Locked, III-V Semiconductor Reactive Ion Beam Etch Reactor (RIBE) at the Center for Integrated Nanotechnologies (CINT) and Sandia National Laboratories (SNL).The RIBE reactor supports microfabrication efforts that require etching of complex submicron-scale structures into many common III-V compound semiconductor materials at high precision. It is considered one of the fundamental tools for the advancement of material science and the development of nanotechnologies. The new system will include a single 100-200mm transfer chamber, a heated reaction chamber that includes a high power inductively coupled plasma unit, a heated/biasing electrode with associated gas delivery, vacuum and cooling systems, optical emissions spectrometry and laser interferometry. BSA invites you to participate in accordance with the RFI letter and all supporting attachments. This requirement has been posted on the SAM.gov website under solicitation RFI-417070B. The response due date is July 15, 2022 at 4:30PM. Any questions concerning this RFI must be addressed via email to the attention of Nick D’Abbraccio (