From: Federal Government(Federal)
Basic Details | Start Date13 Mar, 2018 (about 6 years ago)Due Date27 Mar, 2018 (about 6 years ago)IdentifierN00173-18-Q-GB04 |
Customer / Agency | |
The U.S. Department of Navy, Naval Research Laboratory Contracting Division, proposes to enter into a sole source contract with Oxford Instruments America, Inc. for the procurement of an Open-Load Inductively Coupled Plasma - Reactive Ion Etching (ICP-RIE) Plasma Etch System. The ICP-RIE Etcher is to be installed within a Class 100 clean room at NSI, real time data logging of process parameters, and is computer controlled via menu-driven Windows 10TM-based environment software for multiple users. The contemplated contract type will be Firm Fixed Price (FFP). This notice is NOT a request for the receipt of proposals or competitive offers.A determination by the Government to compete, or not, will be based on the responses received, and is solely within the discretion of the Government. Information received will normally be considered only for the purpose of determining whether to conduct a competitive procurement.The PSC is 3670 and the NAICS is